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Robust ICP-OES System iCAP PRO Series

Robust ICP-OES System iCAP PRO Series

Key words:

  • Commodity name： Robust ICP-OES System iCAP PRO Series

Category:

Inductively Coupled Plasma Atomic Emission Spectrometry (ICP-OES)

E-mail:

zhuohuangkeji@163.com

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  • Product Description

  • Robust ICP-OES System Highlights

    Excellent detection

    These ICP-OES systems integrate easy-to-use software and multi-element detection technology, far superior to single-element AAS analysis and multi-element microwave plasma technology.

    Easy to use

    The standard configuration is equipped with a variety of optimization settings, making these instruments ideal for users who are new to the technology or require simple solutions for multi-element analysis.

    Accuracy

    The new vertical torch type design ensures high matrix robustness across multiple sample types, and the Intelligent Full Range (iFR) analysis mode can measure the entire wavelength range in one measurement, simplifying method development and analysis without compromising sensitivity or accuracy.

    Product Comparison

      iCAP PRO ICP-OES iCAP PRO X ICP-OES
    Plasma View Vertical radial or vertical bidirectional
    Start-up time 1 hour (counting from shutdown) 15 minutes (counting from standby)
    Wavelength range iFR mode 167.021 nm - 852.145 nm, with full spectrum capture capability
    Resolution 200 nm 7 pm
    Radial and Bidirectional RF Sources 1150 W 750, 1150 or 1350 W
    Airflow control Optimized MFC
    plasma gas Stable at 12.5 L/min Optimized to stabilize at 8.5, 12.5 or 14.5 L/min
    Auxiliary gas Stable at 0.5 L/min 0.5, 1 or 1.5 L/min optional
    Atomizing gas 0.3 to 0.8 L/min 0 to 1.5 L/min

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