Vietnam Robust ICP-OES System iCAP PRO Series

Robust ICP-OES System iCAP PRO Series

Category:

VietnamInductively Coupled Plasma Atomic Emission Spectrometry (ICP-OES)

Product Description

Robust ICP-OES System Highlights

Excellent detection

These ICP-OES systems integrate easy-to-use software and multi-element detection technology, far superior to single-element AAS analysis and multi-element microwave plasma technology.

Easy to use

The standard configuration is equipped with a variety of optimization settings, making these instruments ideal for users who are new to the technology or require simple solutions for multi-element analysis.

Accuracy

The new vertical torch type design ensures high matrix robustness across multiple sample types, and the Intelligent Full Range (iFR) analysis mode can measure the entire wavelength range in one measurement, simplifying method development and analysis without compromising sensitivity or accuracy.

Product Comparison

  iCAP PRO ICP-OES iCAP PRO X ICP-OES
Plasma View Vertical radial or vertical bidirectional
Start-up time 1 hour (counting from shutdown) 15 minutes (counting from standby)
Wavelength range iFR mode 167.021 nm - 852.145 nm, with full spectrum capture capability
Resolution 200 nm 7 pm
Radial and Bidirectional RF Sources 1150 W 750, 1150 or 1350 W
Airflow control Optimized MFC
plasma gas Stable at 12.5 L/min Optimized to stabilize at 8.5, 12.5 or 14.5 L/min
Auxiliary gas Stable at 0.5 L/min 0.5, 1 or 1.5 L/min optional
Atomizing gas 0.3 to 0.8 L/min 0 to 1.5 L/min